Supporting Information Multiphase Structure of Tantalum Oxynitride ...
Supporting Information
Multiphase Structure of Tantalum Oxynitride TaOxNy Thin Films Deposited by Reactive Magnetron Sputtering Christine Taviot-Guého,* Joël Cellier, Angélique Bousquet, Eric Tomasella Université Clermont Auvergne, Université Blaise Pascal, Institut de Chimie de Clermont-Ferrand, BP 10448, F-63000 CLERMONT-FERRAND, FRANCE CNRS, UMR 6296, ICCF, F-63178 AUBIERE, FRANCE
Figure S1. X-ray diffraction patterns of (a) as-prepared films and (b) silica substrate using an Ag anticathode as an X-ray source. The inset in panel a) shows XRD data in the 4-40° 2θ range.
Figure S2. Comparison between the experimental PDF obtained at RF=0 and the simulated PDF of the Fm-3m TaN reference.43
Figure S3 Structure of β-TaON showing planes containing only oxygen atoms along the aaxis, alternating with Ta,N planes.34,34
Table S1. Binding energies of Ta4f 5/2 and Ta4f 7/2 peaks for TaN, Ta3N5, TaON, Ta2O5
Composition
Ta4f5/2 (eV)
Ta4f7/2 (eV)
References
TaN
24,8
23,5
72
Ta3N5
26,7
24,8
70
TaON
27,7
25,8
70
28,4
26,2
71
28,5
26,6
70
Ta2O5
REFERENCES (33) Yashima, M.; Lee, Y.; Domen K. Crystal Structure and Electron Density of Tantalum Oxynitride, a Visible Light Responsive Photocatalyst. Chem. Mater. 2007, 19, 588-593. (34) Weishaupt, M. Strähle, J. Preparation of the oxide nitrides VON, NbON, and TaON. The crystal structure of NbON and TaON. Z. Anorg. Allg. Chem. 1977, 429, 261269. (43) Elangovan, T.; Murugeshan, S.; Mangalaraj, D.; Kuppusami, P.; Khan, S.; Sudha, C.; Ganesan, V.; Divakar, R.; Mohandas, E. Synthesis and high temperature XRD studies of tantalum nitride thin films prepared by reactive pulsed dc magnetron sputtering. J. Alloys Compd. 2011, 509, 6400-6407. (70) Chun, W.J.; Ishikawa, A.; Fujisawa, H.; Takata, T.; Kondo, J. N.; Hara, M.; Kawai, M. ; Matsumoto, Y.; Domen, K. Conduction and valence band positions of Ta2O5, TaON, and Ta3N5 by UPS and electrochemical methods. J. Phys. Chem. B 2003, 107, 1798-1803. (71) Kerrec, O. ; Devilliers, D. ; Groult, H. ; Marcus, P. Study of dry and electrogenerated Ta2O5 and Ta/Ta2O5/Pt structures by XPS. Mater.Sci. Eng. B 1998, 55, 134-142. (72) Zhang, Q. Y.; Mei, X. X.; Yang, D. Z.; Chen, F. X.; Ma, T. C.; Wang, Y. M.; Teng, F. N. Preparation, structure and properties of TaN and TaC films obtained by ion beam assisted deposition. Nucl. Instrum. Meth. B 1997, 127–128, 664-668.
Multiphase Structure of Tantalum Oxynitride TaOxNy Thin Films Deposited by Reactive Magnetron Sputtering Christine Taviot-Guého,* Joël Cellier, Angélique Bousquet, Eric Tomasella Université Clermont Auvergne, Université Blaise Pascal, Institut de Chimie de Clermont-Ferrand, BP 10448, F-63000 CLERMONT-FERRAND, FRANCE CNRS, UMR 6296, ICCF, F-63178 AUBIERE, FRANCE
Figure S1. X-ray diffraction patterns of (a) as-prepared films and (b) silica substrate using an Ag anticathode as an X-ray source. The inset in panel a) shows XRD data in the 4-40° 2θ range.
Figure S2. Comparison between the experimental PDF obtained at RF=0 and the simulated PDF of the Fm-3m TaN reference.43
Figure S3 Structure of β-TaON showing planes containing only oxygen atoms along the aaxis, alternating with Ta,N planes.34,34
Table S1. Binding energies of Ta4f 5/2 and Ta4f 7/2 peaks for TaN, Ta3N5, TaON, Ta2O5
Composition
Ta4f5/2 (eV)
Ta4f7/2 (eV)
References
TaN
24,8
23,5
72
Ta3N5
26,7
24,8
70
TaON
27,7
25,8
70
28,4
26,2
71
28,5
26,6
70
Ta2O5
REFERENCES (33) Yashima, M.; Lee, Y.; Domen K. Crystal Structure and Electron Density of Tantalum Oxynitride, a Visible Light Responsive Photocatalyst. Chem. Mater. 2007, 19, 588-593. (34) Weishaupt, M. Strähle, J. Preparation of the oxide nitrides VON, NbON, and TaON. The crystal structure of NbON and TaON. Z. Anorg. Allg. Chem. 1977, 429, 261269. (43) Elangovan, T.; Murugeshan, S.; Mangalaraj, D.; Kuppusami, P.; Khan, S.; Sudha, C.; Ganesan, V.; Divakar, R.; Mohandas, E. Synthesis and high temperature XRD studies of tantalum nitride thin films prepared by reactive pulsed dc magnetron sputtering. J. Alloys Compd. 2011, 509, 6400-6407. (70) Chun, W.J.; Ishikawa, A.; Fujisawa, H.; Takata, T.; Kondo, J. N.; Hara, M.; Kawai, M. ; Matsumoto, Y.; Domen, K. Conduction and valence band positions of Ta2O5, TaON, and Ta3N5 by UPS and electrochemical methods. J. Phys. Chem. B 2003, 107, 1798-1803. (71) Kerrec, O. ; Devilliers, D. ; Groult, H. ; Marcus, P. Study of dry and electrogenerated Ta2O5 and Ta/Ta2O5/Pt structures by XPS. Mater.Sci. Eng. B 1998, 55, 134-142. (72) Zhang, Q. Y.; Mei, X. X.; Yang, D. Z.; Chen, F. X.; Ma, T. C.; Wang, Y. M.; Teng, F. N. Preparation, structure and properties of TaN and TaC films obtained by ion beam assisted deposition. Nucl. Instrum. Meth. B 1997, 127–128, 664-668.
